发明名称 |
Light-sensitive composition |
摘要 |
A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
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申请公布号 |
US4950582(A) |
申请公布日期 |
1990.08.21 |
申请号 |
US19880176196 |
申请日期 |
1988.03.31 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AOAI, TOSHIAKI;AOSHIMA, KEITARO;OKAMOTO, YASUO |
分类号 |
G03C1/72;C08G18/38;C08G18/83;G03F7/021;G03F7/022;G03F7/023;G03F7/035;G03F7/095 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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