| 摘要 |
<p>An electron beam exposure data processing method includes the steps of inputting exposure data relating to a pattern to be written (steps 201, 203), and determining whether or not the pattern should be subjected to a framing process (step 202). The method further includes performing the framing process when it is determined that the pattern should be subjected to the framing process so that the pattern is partitioned into a frame pattern and an inner pattern surrounded by the frame pattern (step 204), reducing the inner pattern by a reduction rate to thereby generate a reduced inner pattern (step 205), and determining an exposure dose for the frame pattern and an exposure dose for the reduced inner pattern (step 206). There are also provided an electron beam exposure method which employs the electron beam exposure data processing method and an apparatus implementing the same.</p> |
