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发明名称
HEAT TREATMENT FURNACE FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH02201920(A)
申请公布日期
1990.08.10
申请号
JP19890020480
申请日期
1989.01.30
申请人
ARUBATSUKU B T U KK
发明人
ARIMA YASUJI
分类号
H01L21/324;H01L21/22;H01L21/223;H01L21/31
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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