发明名称 MUDENKAIMETSUKIHO
摘要 PURPOSE:To form a film only on a metallic oxide film having an arbitrary pattern on a substrate by plating by sensitizing the substrate in a soln. contg. stannous chloride and hydrofluoric acid or hydrofluoride before activating the substrate. CONSTITUTION:A metallic oxide film having an arbitrary pattern is formed on an insulating substrate. The substrate is sensitized by immersion in a stannous chloride soln., and it is immersed in a soln. of hydrofluoric acid or hydrofluoride. Hydrofluoric acid or hydrofluoride may be added to the stannous chloride soln. to prepare a sensitizing soln. for sensitizing the substrate. The sensitized substrate is activated by immersion in >=1 kind of soln. selected from solns. of palladium, silver and gold salts. The activated substrate is subjected to electroless plating.
申请公布号 JPH0235030(B2) 申请公布日期 1990.08.08
申请号 JP19820184954 申请日期 1982.10.21
申请人 SEIKO EPSON CORP 发明人 OONO YOSHIHIRO
分类号 C04B41/88;C03C17/36;C23C18/18;C23C18/28;C23C18/30;H05K3/18 主分类号 C04B41/88
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