| 摘要 |
PURPOSE:To accurately detect the position of the face of a substance, such as the surface of a water, by measuring both positions of a plurality of points in a pattern region one after another and calculating the position of the face of the pattern region based on the face position data. CONSTITUTION:A plurality of measurement positions corresponding to each of the lattice points of a lattice 23 are distributed around a measured position 22 to detect a face position. The face position of the measured position 22 is measured with face position measurement systems 4-11, the measured value is made to be A0, and the surface positions of each of the lattice points are measured to obtain n numbers of measurement values. Differences between the n numbers of the measurement values of the positions of the surface of a wafer are considered to be due to differences in structure and arrangement between patterns at the lattice points 1-n because the position of the surface of the wafer is fixed in the direction of the height, therefore, when the average A of the measured values is found face position information on the wafer 2 without detection error can be obtained. A difference between the average A and the measurement value A0 at the position 22, A-A0, is an inherent detection error in processes of different pattern structures, therefore, is a correction value in surface position detection. Thereby the correction value corresponding to the inherent detection error in processes of different pattern structures can be measured accurately in a short time. |
