发明名称 METHOD OF AND APPARATUS FOR PRODUCING DIAMOND THIN FILMS
摘要 The present invention concerns a method of producing a diamond thin film, wherein a plasma-activated gas obtained by exciting a starting material containing a carbon source gas is brought into contact with a surface of a substrate, on which a diamond thin film is to be formed under the presence Or an auxiliary member placed adjacent to a convexed portion present at the surface Or the substrate, on which the diamond thin film is to be formed, thereby forming the diamond thin film on the substrate, as well as an apparatus for producing a diamond thin film by means of a microwave plasma method, wherein an auxiliary member is placed adjacent to a convexed portion present at the surface or the substrate on which diamond thin film is to be formed.
申请公布号 CA2007780(A1) 申请公布日期 1990.07.13
申请号 CA19902007780 申请日期 1990.01.15
申请人 IDEMITSU PETROCHEMICAL COMPANY LIMITED 发明人 HAYASHI, NARIYUKI;ITO, TOSHIMICHI
分类号 C23C16/27;C23C16/458;C30B25/12;(IPC1-7):C23C16/26;C23C16/46;C23C16/50 主分类号 C23C16/27
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