VERFAHREN UND VORRICHTUNG ZUR REINIGUNG UND TROCKNUNG MITTELS DAMPF

摘要

An article 20 such as a photomask, reticle, or semiconductor wafer is cleaned in chamber 13 by vapour introduced thereinto via passages 10 from evaporator 70 wherein vapour is produced by heating a liquid supplied from reservoir 41. The liquid may be isopropyl alcohol. The vapour may be condensed by cooling equipment 16, 17 and the condensate may be discharged via tubes 18, 19. Chamber 13 may be provided with heat retaining means 14. The supply of liquid to the evaporator and temperature of heater 5 may be regulated by a controller. <IMAGE>