发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To project monochroic X-rays by a method wherein contraction or expansion mirrors in the X and Y directions made of symmetrically cut single crystal bodies are used while respective mirrors are selectively set up at specified Bragg angles. CONSTITUTION:Radiant light 12 from an X-ray source 11 such as synchrotron is firstly made monochroic in specific wavelength by a monochromator 13 before passing through an exposure mask 14 and after successively passing through an X-direction contracting mirror 15 and a Y-direction contracting mirror 16 respectively made of symmetrically cut single crystal bodies so that the pattern of an exposure mask 14 may be contraction-projected on an exposed substrate 17 coated with a resist film.
申请公布号 JPH02153520(A) 申请公布日期 1990.06.13
申请号 JP19880308079 申请日期 1988.12.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 KAMON KAZUYA
分类号 G21K1/06;G03F7/20;H01L21/027;H01L21/30 主分类号 G21K1/06
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