| 摘要 |
PURPOSE:To enhance the definition of dots of a photosensitive resin layer and to shorten the time for development by incorporating a specific compd. at a specific ratio into the developing soln. CONSTITUTION:Dialkyrol amide (e.g.: lauryl diethanol amide), alkyl diphenyl ether having a sulfonic acid group, or the condensation product of naphthalene sulfonic acid is incorporated at 0.3 to 1.0wt.% into the title developing soln. The development void in the part of the smallest point of dots is defective if the content of the above-mentioned compd. is below the above-mentioned ratio. The photocured part is swollen if the ratio exceeds the above-mentioned ratio. A pH adjusting agent, such as sodium phosphate, org. solvent, such as 2-butoxyethanol, and a surfactant may be added to the developing soln. |
