发明名称 MASK BLANK
摘要 <p>PURPOSE:To facilitate a theta adjustment and to shorten the time for adjustment by using regions on a glass substrate where a light shielding film is not formed as patterns for the rough theta adjustment of an inspection apparatus, etc. CONSTITUTION:A stage is moved to the position of a mask 5 and the center of a rectangle 1 on the left side is aligned to the center of the visual field of a microscope. The stage is then moved to the position of the mask 5 to bring the position right under the rectangle on the right side to the center of the visual field. A turn table is rotated by alpha to match the rectangle 2 with the height of h/2 if the center of rotation of the turn table exists at the center of the mask. The rough adjustment is thus completed. The patterns such as patterns 7 and 8 used for the fine theta adjustment having the same Y coordinate are regarded as the two same patterns and the fine adjustment is carried out by the similar method. The theta adjustment is thus easily carried out and the time required for the adjustment is shortened even if the patterns suitable for the theta adjustment do not exist.</p>
申请公布号 JPH02106746(A) 申请公布日期 1990.04.18
申请号 JP19880259547 申请日期 1988.10.17
申请人 MATSUSHITA ELECTRON CORP 发明人 NIIKE TAKUMI
分类号 G03F1/42;G03F1/50;H01L21/027 主分类号 G03F1/42
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