发明名称 Method of producing an image reversal negative photoresist having a photo-labile blocked imide.
摘要 <p>A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.</p>
申请公布号 EP0361906(A2) 申请公布日期 1990.04.04
申请号 EP19890309859 申请日期 1989.09.28
申请人 HOECHST CELANESE CORPORATION 发明人 MAMMATO, DONALD C.;JAIN, SANGYA;DURHAM, DANA;SPAK, MARK A.;USIFER, DOUGLAS;MCFARLAND, MICHAEL
分类号 G03F7/022;G03F7/038;G03F7/039;H01L21/027 主分类号 G03F7/022
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