MULTILAYER CERAMICS COATINGS FROM THE CERAMIFICATION OF HYDROGEN SILSESQUIOXANE RESIN IN THE PRESENCE OF AMMONIA

摘要

Hydrogen silsesquioxane resin can be ceramified at low temperature in the presence of ammonia, with or without platinum or rhodium catalysis, to form a ceramic coating on the surface of a substrate. The nitrided silica coatings produced are useful as interlevel dielectric films or for planarizing and protecting the surface of electronic devices. For further surface protection, overcoating the nitrided silica with an additional layer of a passivating ceramic material and a top layer of a barrier ceramic material is also described.