发明名称 Quartz glass container for the thermal treatment of semiconductor wafers
摘要 A quartz glass container (10) for accommodating semiconductor wafers for their thermal treatment is proposed. It consists essentially of a tube (11) having a sealable charging opening (12). The tube (11) is provided essentially in the region of its top side (16) with at least one longitudinal carrier (18) which is arranged essentially parallel to the axis (17) of the tube (11). <IMAGE>
申请公布号 DE3840588(C1) 申请公布日期 1990.02.22
申请号 DE19883840588 申请日期 1988.12.02
申请人 WESTDEUTSCHE QUARZSCHMELZE GMBH & CO. KG, 2054 GEESTHACHT, DE 发明人 RAESCH, FRITHJOF, DIPL.-ING.;ZELL, EBERHARD, 2054 GEESTHACHT, DE
分类号 C04B35/14;H01L21/00;H01L21/673 主分类号 C04B35/14
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