发明名称 Saponified polyvinyl acetate derivatives which are photosensitive resin compositions
摘要 A photosensitive resin composition comprising a photosensitive saponified poly(vinyl acetate) derivative containing in the backbone thereof at least one of a first group of photosensitive units which are represented by the general formula (I) <IMAGE> (I) wherein <IMAGE> represents a vinyl alcohol residue in the backbone of the saponified poly(vinyl acetate) derivative; Y represents a member selected from the group consisting of the following general formulae (II) and (III) <IMAGE> m denotes an integer of 1-6; n denotes 0 or 1; R1 represents a member selected from a hydrogen atom, an unsubstituted alkyl and an unsubstituted aralkyl group, a hydroxyl group, a carbamoyl group, an ether bond and an unsaturated bond; R2 represents a member selected from a hydrogen atom and a lower alkyl group; and X- represents an anion, and at least one of a second group of photosensitive units having an ethylenic unsaturated double bond which are represented by the general formulae (IV) and (V) <IMAGE> (II) <IMAGE> (III) wherein <IMAGE> is as defined above; R3 represents a member selected from a hydrogen atom, a lower alkyl group, a nitrophenyl group, a halogen atom, an aminophenyl group and a phenyl group; R4, R5 and R6 respectively represent a member selected from a hydrogen atom, a lower alkyl atom, a halogen and a phenyl group; and t1 represents 0 or 1.
申请公布号 US4891300(A) 申请公布日期 1990.01.02
申请号 US19870099959 申请日期 1987.09.23
申请人 DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY;OJI KAKO CO., LTD. 发明人 ICHIMURA, KUNIHIRO;ITOH, HIROSHI;NAKAZATO, SHUUICHI;TAKAZAWA, HIDEAKI
分类号 C08F8/30;G03F7/038 主分类号 C08F8/30
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