发明名称 Radiation-curable composition for forming an abrasion-resistant antistatic layer.
摘要 <p>A radiation-curable composition useful in forming an abrasion-resistant antistatic layer is comprised of a salt, such as an alkali metal fluoroborate, dissolved in a mixture of (1) a poly(alkylene glycol)diacrylate and (2) an acrylic monomer containing at least three acrylic ester groups. The composition can be coated in the form of a thin layer and cured by suitable means, such as an electron beam accelerator or a source of ultraviolet radiation, to form an antistatic layer of particular utility as a component of a photographic material.</p>
申请公布号 EP0347342(A2) 申请公布日期 1989.12.20
申请号 EP19890420206 申请日期 1989.06.12
申请人 EASTMAN KODAK COMPANY (A NEW JERSEY CORPORATION) 发明人 CHEN, JANGLIN C/O EASTMAN KODAK COMPANY;DOTSON, BILLY R. C/O EASTMAN KODAK COMPANY
分类号 C09K3/16;G03C1/89 主分类号 C09K3/16
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