| 摘要 |
PURPOSE:To prevent concentration of ozone from dropping due to thermal decomposition and improve performance of eliminating resists at low temperature by a method wherein radiant heat from a light source is cut by a pure water tank and a gas circuit and a nozzle for supplying gas containing ozone are provided in a space opposite to the light source which is cooled by the pure water tank. CONSTITUTION:A high output ultraviolet light source is composed of a low pressure mercury lamp 2, a high frequency discharge power source 1 such as microwaves or the like as a lighting power source and a cavity 3, and ultraviolet rays are irradiated via a mesh 12 having rapid transmittance of 90% or higher through a water tank 5 made of synthetic quartz which makes pure water flow to cut radiant heat from the light source. At the side of a wafer of the tank 5, a supply port 8 of ozone is provided, and a synthetic quarts plate having a number of holes 11 for exhausting ozone is tightly attached. A gas flow gap between a side of the tank facing a material to be processed and the material to be processed should be 0.5mm or narrower. Since with this constitution, radiant heat of 300 deg.C at a pipe wall temperature of ultraviolet light is shut by the pure water tank 5, the wafer can be processed with wafer temperature of 200 deg.C or lower. Also since ozone to be supplied is not overheated, concentration of ozone does not drop due to thermal decomposition, improving efficiency for eliminating resists at low temperature. |
