ION BEAM DEPOSITION METHOD,申请号JP19870282523-传众专利搜索

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发明名称	ION BEAM DEPOSITION METHOD
摘要
申请公布号	JPH01127671(A)	申请公布日期	1989.05.19
申请号	JP19870282523	申请日期	1987.11.09
申请人	ANELVA CORP	发明人	TAMURA YOSHIHIRO
分类号	C23C14/32	主分类号	C23C14/32
代理机构		代理人
主权项
地址

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