发明名称 Method for the production of heat-resistant structured layers
摘要 A cost-efficient method for producing dimensionally precise and high-grade heat-resistent structured layers by applying a single coating of a radiation-sensitive soluble polyether-based photopolymer in the form of a layer or foil on a substrate; irradiating the layer or foil through a negative with actinic light or by guiding a light, electron, laser, or ion beam; removing the nonirradiated layer or foil portions; and subsequent optional annealing, wherein the photopolymer comprises an addition product of an olefin-unsaturated monoisocyanate and a polether having at least one hydroxyl group. The layers provided according to the invention can withstand the thermal and mechanical stresses of dip soldering process, and protect circuit surfaces effectively and durably against moisture and corrosion; they are therefore suitable in particular as solder resist and insulating layers in microconductor technology.
申请公布号 US4828948(A) 申请公布日期 1989.05.09
申请号 US19860877872 申请日期 1986.06.24
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 AHNE, HELLMUT;PLUNDRICH, WINFRIED
分类号 G03F7/26;A61K38/00;C08G18/48;C08G18/81;G03F7/038;H01B3/36;H01B3/42 主分类号 G03F7/26
代理机构 代理人
主权项
地址