TECHNOLOGIC POSITION FOR SUBSTRATE PROCESSING ON SEMICONDUCTOR PRODUCTION,申请号CS19860009708-传众专利搜索

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发明名称	TECHNOLOGIC POSITION FOR SUBSTRATE PROCESSING ON SEMICONDUCTOR PRODUCTION
摘要
申请公布号	CS263218(B1)	申请公布日期	1989.04.14
申请号	CS19860009708	申请日期	1986.12.22
申请人	RASKA STANISLAV ING.,CS	发明人	RASKA STANISLAV ING.,CS
分类号	H01L21/02;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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