发明名称 Method for manufacturing a BiCMOS device
摘要 A semiconductor integrated circuit device is disclosed which comprises a bipolar transistor and a field effect transistor, in which a gate electrode of the field effect transistor and a collector electrode of the bipolar transistor are formed from a common electrode layer of a high impurity concentration, and in which the collector region of the bipolar transistor comprises a region of a high impurity concentration having a conductivity type the same as that of the collector region of the bipolar transistor.
申请公布号 US4818720(A) 申请公布日期 1989.04.04
申请号 US19870096241 申请日期 1987.09.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IWASAKI, HIROSHI
分类号 H01L21/76;H01L21/225;H01L21/331;H01L21/8249;H01L27/06;H01L29/73;H01L29/732;(IPC1-7):H01L29/78 主分类号 H01L21/76
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