发明名称 METHOD AND DEVICE FOR CORRECTING PATTERN
摘要 <p>PURPOSE:To form a thin film which is charged to the opposite polarity from the specific part of a pattern and has specific optical density efficiently, by supplying a specific part with gas for forming the thin film with the specific density. CONSTITUTION:The position, size, etc., of a white defect 11 on the pattern 1a to be corrected are determined to set correction conditions and a correcting process is entered. Namely, the surface part of a scanning area 12 is charged electrically and positively by the scanning 13 of a beam and supplied with the gas which forms the thin film with the specific optical density when irradiated with a convergent ion beam 4, and the charged gas 10 which is charged electrically and negatively by a charging part is blown by a nozzle 5. At this time, the scanning area 12 and charged gas 10 have the mutually opposite polarities, so they attract each other with Coulomb force and the charged gas 10 sticks effectively on the surface part of the scanning area 12. Consequently, the production of the thin film 14 with the specific optical density is made efficient and speedy to improve the productivity.</p>
申请公布号 JPS6462645(A) 申请公布日期 1989.03.09
申请号 JP19870219826 申请日期 1987.09.02
申请人 MITSUBISHI ELECTRIC CORP 发明人 MORIIZUMI KOICHI
分类号 G03F1/00;H01L21/027;H01L21/30;H01L21/66 主分类号 G03F1/00
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