发明名称 Method of manufacturing platinum resistance thermometer
摘要 A method of manufacturing a resistance thermometer which includes the steps of preparing a support substrate and forming a platinum film, which serves as a temperature measuring element, on the support substrate by a sputtering process employing a sputtering gas which contains a predetermined amount of oxygen gas, and a resistance thermometer produced by the method. The method which optionally includes forming an aluminum oxide film, the substrate and the platinum film.
申请公布号 US4805296(A) 申请公布日期 1989.02.21
申请号 US19860905392 申请日期 1986.09.10
申请人 SHARP KABUSHIKI KAISHA 发明人 JINDA, AKIHITO;FURUBAYASHI, HISATOSHI;HIJIKIGAWA, MASAYA;TABUCHI, HIROKI
分类号 G01F1/692;G01F1/696;G01K7/18;H01C7/02;H01C17/12;H01C17/23;(IPC1-7):H01C17/06 主分类号 G01F1/692
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