发明名称 |
Method of manufacturing platinum resistance thermometer |
摘要 |
A method of manufacturing a resistance thermometer which includes the steps of preparing a support substrate and forming a platinum film, which serves as a temperature measuring element, on the support substrate by a sputtering process employing a sputtering gas which contains a predetermined amount of oxygen gas, and a resistance thermometer produced by the method. The method which optionally includes forming an aluminum oxide film, the substrate and the platinum film.
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申请公布号 |
US4805296(A) |
申请公布日期 |
1989.02.21 |
申请号 |
US19860905392 |
申请日期 |
1986.09.10 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
JINDA, AKIHITO;FURUBAYASHI, HISATOSHI;HIJIKIGAWA, MASAYA;TABUCHI, HIROKI |
分类号 |
G01F1/692;G01F1/696;G01K7/18;H01C7/02;H01C17/12;H01C17/23;(IPC1-7):H01C17/06 |
主分类号 |
G01F1/692 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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