| 摘要 |
PURPOSE:To enable the polyimidation of the titled composition by a relatively low temperature treatment by incorporating a specified polymer in the titled composition. CONSTITUTION:The titled composition contains the polymer which has a repeating unit shown by formula I and can be converted to a polymer having >=300 deg.C a temperature of commercing the thermogravimetric reduction by thermally treating, and a photopolymerization initiator. In the formula, X is a four valent carbon ring or heterocyclic ring group, Y is a two valent carbon ring or heterocyclic ring group, Z shows a binding between groups X and Y, and consists of 90-10mol.% a group shown by formula II, 90-40mol.% a group shown by formula III, and 10-60mol.% a group shown by formula IV, R is a group having a reactive carbon-carbon double bond. A cover layer which does not cause layer-to-layer peeling and does not produce a blister, even in case of a fluxing treatment, is obtd. by forming for example, a dry film from the titled composition, and then, laminating said films on a substrate plate, followed by patterning it, and then, by thermally treating the patterned film at a prescribed condition for example, 230 deg.C, for 1hr, in the atmosphere of nitrogen gas to convert said film to the polyimide pattern. |
