PRODUCTION OF BORON CARBONITRIDE FILM

摘要

PURPOSE:To stably form a thin boron carbonitride film on the surface of a substrate by vapor-depositing C and B on the surface of the substrate in a vacuum vessel and implanting N ions into the substrate. CONSTITUTION:An Si substrate 7 is rotatably fitted to the inside of a vacuum vessel 1 and the vessel 1 is evacuated to about 10<-5> Pa by a vacuum pump P. N<+> ions from a nitrogen ion emitter 3 are implanted into the substrate 7. At the same time, C and B atoms. are evaporated from C and B atom. evaporators 4, 5 with electron guns and deposited on the surface of the substrate 7. A thin boron carbonitride film is formed on the substrate 7 by the implanted N<+> ions.