| 摘要 |
PURPOSE:To improve working efficiency and the accuracy in size of a pattern, by measuring the width of a check pattern, which is formed on a mask or a reticle, by size measuring means of an exposure apparatus, selecting the signal of the width, which is measured by an exposure-condition setting means, and data corresponding to an exposure time, which is stored beforehand, and setting the final exposure time. CONSTITUTION:The presence or absence of a mask 25 on a mask receiver 24 is detected with a photosensor 23 in a size measuring instrument 4 of an exposure apparatus. When the mask 25 is set, the size of the width of a check pattern, which is provided on the mask, is measured. When the measurement of the size is finished, the mask 25 is taken out of the measuring instrument 4 with a transfer fork 15. The mask is set on a mask holder 18 through a mask transfer path 13. An exposure-time setting device 1 is composed of a comparator circuit, a memory unit and the like. An exposure time corresponding to the check pattern is stored in the memory beforehand. When the measured value of the size of the check pattern is inputted, the exposure-time corresponding to the measured value of the size is automatically selected in real time, and an optical system 3 is operated at the preset exposure time.
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