| 摘要 |
PURPOSE:To increase a sensitivity by irradiating compound ions containing an oxygen ion or oxygen from an ion source different from a primary ion source and conducting an analysis with an oxygen density of 30atom.% or above in an analyzing region from the surface of a specimen to an about 2,000Angstrom depth. CONSTITUTION:An ion implantation optical system 2 for sputtering a specimen in an analysis is provided together with a primary ion optical system 1 composed of, for example, an ion source 4 and the like and an analytic result is displayed on a CRT 16 or the like via a secondary ion optical system 3. The optical system 2 is constructed so that accelerating energy can be set to 1-1,000kV. Accelerated ions are irradiated from an implanting ion source 10 on the surface of a specimen 9 to increase an oxygen density on a measuring surface and increase the yield of secondary ions of impurities in the specimen. Accordingly, the highly sensitive analysis can be conducted.
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