| 摘要 |
PURPOSE:To manufacture titanium boride combining high purity with high density at high reaction velocity while reducing the amount of by-product hydrochloric acid, by allowing a titanium halide compound to react with boron hydride by using a chemical vapor deposition method. CONSTITUTION:In a raw material gas-feed system 10, an H2 gas is fed as a carrier gas from a bomb 11 into a TiCl4 vessel 15 in a thermostat bath 16 so as to vaporize TiCl4. On the other hand, B2H6 is fed from a bomb 12 together with the H2 gas. The above-mentioned TiCl4 and B2H6 are mixed, which is introduced into a reaction furnace 20 equipped with an evacuation system 30. Proper mole ratio between the above-mentioned B2H6 and TiCl4 is 0.1/1-4/1. Then, B2H6 is allowed to react with TiCl4 in the above reaction furnace 20 preferably at 973-1973K reaction temp. under 0.6-1.1kPa reaction pressure so as to be formed into TiB2.
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