| 摘要 |
PURPOSE:To enhance a processing speed by a method wherein, when a pattern data is supplied to a charged particle beam generation source, it is transferred via more than two data storage means so that the waiting time of the data at the charged beam generation source is eliminated. CONSTITUTION:If the information designed by a controller CAD is sent out to a one- chip pattern generator PG, the generator PG divides the drawing information on one chip into the drawing information for an upper half and that for a lower half and sends these two pieces of information to individual 1/2 chip memories MU, ML alternately. Because the memories MU, ML are used alternately in this manner, it is possible to substantially eliminate a loss of the time during a data transfer from the generator PG. While each EB source is defelected by its X-direction deflecting electrodes X1, X2 in an X-direction and executes a drawing operation in the X-direction within a range to be covered by a deflection on the basis of the drawing information for the upper half from the memories MU, ML, a wafer WF and a head MB are continuously shifted relatively in a Y-direction. By this setup, all picture elements in the Y-direction in a 1/2 region are drawn. If the drawing operation is repeated while the wafer WF and the head MB are intermittently shifted relatively in the X-direction in the same manner, one chip row in the Y-direction can be drawn.
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