| 摘要 |
PURPOSE:To irradiate an object to be irradiated more uniformly by concentrically placing annular light sources to form ring-shaped light source means, thereby forming plane light sources which are rotationally symmetrical relative to the center of the object to be irradiated. CONSTITUTION:A wafer 5 to be treated which is supported by a supporting stand 6 of an object to be irradiated is placed in a chamber 2 which is transparent with respect to the irradiation light for heating. Four upper and lower annular light sources for heating 1a, 1b, 1c, 1d provided in planes parallel with the upper and lower surfaces of the chamber 2 so as to sandwich the chamber are placed concentrically at a substantially equal interval around a straight line corresponding to the normal line N at the central position of the wafer 5 to be treated. With this, the whole wafer 5 surface can be heated and cooled uniformly. Further, there are provided a port 3 for taking out a wafer which can be closed up, a gas intake 4 in the central upper part, and a system for measuring the wafer temperature and a gas discharge port 12 in the central lower part. The system for measuring the wafer temperature is comprised of an objective lens 7, a relay lens 8, a scanning mirror 9, a condensing lens 10 and a detector 11, whereby the temperature measurement over the whole wafer 5 surface is enabled. |
