| 摘要 |
A sandblast photoresist laminate article of manufacture comprising an adhesive layer, a membrane support layer, and a resist layer can be used in etching the surface of articles with a pattern which can be revealed by the resist layer. The resist laminate is usable in a variety of modes of etching such as exposing the resist with a pattern, developing the pattern, applying the developed resist to the object, and etching the pattern into the object. Further, the resist can be used by applying the unexposed sheet-like resist to an object, exposing the resist with a pattern, developing the pattern and etching the pattern into the object. Lastly, the resist laminate can be used by exposing the resist with a pattern, applying the exposed resist to an object, developing the pattern, and etching the pattern into the object. The resist compositions are typically water developable after exposure with actinic radiation.
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