发明名称 HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME
摘要 A negative-working radiation-sensitive composition, comprising a mixture of a condensation polymer (A) having recurring units derived from (a) 1,4-bis( beta -hydroxyethoxy)cyclohexane and (b) diethyl-p-phenylenediacrylate; and a condensation polymer (B) having recurring units derived from (a), (b) and (c) dimethyl-3,3'-[sodioimino)disulfonyl]dibenzoate present in a weight ratio of A to B of from about 1:1 to about 9:1, and wherein units derived from (c) are present in an amount less that 1 mole % based on the total units in the polymer mixture, is particularly useful in preparing a printing plate which develops cleanly in an aqueous developer and exhibits improved speed and good incubation stability.
申请公布号 WO8805929(A1) 申请公布日期 1988.08.11
申请号 WO1988US00192 申请日期 1988.01.26
申请人 EASTMAN KODAK COMPANY 发明人 KAPLAN, MARK, STEVEN
分类号 C08G63/672;C08G63/688;C08L67/00;C08L67/02;G03F7/038;(IPC1-7):G03F7/10 主分类号 C08G63/672
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