| 摘要 |
Spurtering coating device which could form an even thickness of coating layer on all surface of a subject. A subject was fixed at one supporting plate being used as anode in vacuum chamber and a target which was made of coating material was fixed at the other supporter being used as cathode under argon gas atmosphere. The two supporters were connected to high voltage for spurtering the particles of coating material. The elliptical target of a curved surface was formed by adhering unit element made of high crystalline coating material onto metallic base palte.
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