| 发明名称 |
PHOTOSENSITIVE POLYMER COMPOSITION |
| 摘要 |
A photosensitive polymer composition comprising (A) a poly(amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150 DEG C. or higher at atmospheric pressure and selected from the group consisting of <IMAGE> wherein Ra, Rb, Rc, m and n are as defined in the specification, has good properties and does not produce cracks on a pattern at the time of development obtained from said composition. |
| 申请公布号 |
DE3471769(D1) |
申请公布日期 |
1988.07.07 |
| 申请号 |
DE19843471769 |
申请日期 |
1984.02.08 |
| 申请人 |
HITACHI, LTD.;HITACHI CHEMICAL CO., LTD. |
发明人 |
KOJIMA, MITHUMASA;KATAOKA, FUMIO;SHOJI, FUSAJI;YOKONO, HITOSHI |
| 分类号 |
C08L79/08;G03F7/004;G03F7/012;G03F7/038;(IPC1-7):G03F7/10 |
主分类号 |
C08L79/08 |
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