发明名称 WHEEL FOR GRINDING III-V GROUP COMPOUND SEMICONDUCTOR WAFER
摘要 PURPOSE:To perform back grinding of a compound semiconductor wafer without after treatment such as cleaning, etc. by constituting a resin bond diamond wheel having flexural elastic modulas of 10-15X10<4>kgf/cm<2> of diamond abrasive grain, filler and bonding agent being resin. CONSTITUTION:Compound semiconductor wafer 1 is absorbed, with the surface down, with vacuum to a chuck table 2 and rotated by a motor 4 through an index table 3 and ground of the back by a ring-shaped abrasive grain layer 13 at the lower face of a cup type grindstone 6 rotating by stone axis 7. This abrasive grain layer 13 constitutes a resin bond diamond wheel having flexural elastic modulas of 10-15X10<4>kgf/cm<2> by diamond grains, filler consisting of alumina, calcium carbonate, silicon carbide and so on and bonding agent consisting of resin. In this way, the back grinding of a compound semiconductor wafer can be executed with the diamond wheel and processing time becomes shorter and after treatment such as cleaning, etc. becomes needless and processing affected layer becomes small and waste fluid doesn't occur and there never happens such a case as will damage clean environment.
申请公布号 JPS63144966(A) 申请公布日期 1988.06.17
申请号 JP19860291901 申请日期 1986.12.08
申请人 SUMITOMO ELECTRIC IND LTD;ASAHI DAIYAMONDO KOGYO KK;NISSHIN KOGYO KK 发明人 NISHIGUCHI KATSUNORI;SEKIGUCHI TAKESHI;MIYOSHI KAZUSHIGE;NISHIO KIYOSHI
分类号 B24D3/02;B24D3/28;H01L21/304 主分类号 B24D3/02
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