MANUFACTURE OF SEMICONDUCTOR DEVICE

摘要

PURPOSE:To align marks each having windowlike pattern to be read at a scale formed on a substrate or a pattern indicated at a center position with the same mask set even if the quantities of the pattern deformations are variably different by using the marks. CONSTITUTION:A mark of first layer has a structure that four sets of scale patterns 2 are disposed in connection with an outer frame 1 and a square pattern 3 is disposed at a center position. The pattern 3 has a double structure of extraction and remainder so as to correspond to variations due to expansion and contraction. A mark 4 of second layer is formed all with glass surfaces at the periphery of the mark and formed of a pattern opened with a window at the center so as to read out a patter for detecting the center position and a scale pattern. Thus, mask aligning step of second step can be accurately performed with a single mask set with respect to the deformation amount of the alignment mark on a substrate in the first step.