| 摘要 |
<p>PURPOSE:To hold the cleaning degree of a semiconductor substrate thereby to avoid the yield-decrease due to a contamination by cleaning and drying an endless belt on the way of returning step of the belt when the substrate is conveyed by the belt. CONSTITUTION:A housing which forms a belt conveying mechanism is partitioned by a partition plate having a belt passing hole, one is used as a cleaning chamber 4 and the other is used as a drying chamber 5. A pair of pulleys 2 are provided at the upper side out of the housing, an endless belt 6 is engaged, a semiconductor substrate 1 is place thereon to be conveyed, and the belt 6 which has completed the conveying is passed through the chambers 4 and 5. In this configuration, an injection nozzle 8 and a pair of brushes 3 are provided in the chamber 4, the belt 6 interposed by brushes 3 is cleaned while cleanser is dropped from the nozzle 8, and rinsing solution is sprayed from another nozzle 9. Then, the belt 6 is advanced to the chamber 5, high temperature drying air is injected from a nozzle 10 for holding the belt 6 to dry the belt 6, which is then returned to the pulleys 2 to be circulated.</p> |
