| 摘要 |
PURPOSE:To form a thin film having excellent quality by sputtering on the surface of a work by providing coil to the outer peripheral face of a vacuum vessel of a magnetron sputtering device disposed with the work between two targets in the vacuum vessel. CONSTITUTION:A rotatable substrate 9 to be treated is supported by a supporting body 10 in the vacuum vessel 1 of the magnetron sputtering device. The targets 3, 4 mounted with electromagnets 5, 6 on the rear surface are disposed above and below the substrate. The inside of the vessel 1 is evacuated to a vacuum and a sputtering gas consisting of a gaseous mixture composed of gaseous Ar and gaseous O2 is introduced into the vessel. The coils 41, 42 provided on the outer peripheral face of the vessel 1 are energized to apply perpendicular magnetic fields to the targets 3, 4; thereafter, glow discharge is generated between the targets 3, 4 and a shutter 12 by high-voltage power supplies 13, 14 to clean the surfaces of the targets 3, 4. The electromagnets 5, 6 are successively energized to open the shutter 12 and the targets 3, 4 are sputtered by the ionized gaseous Ar, by which the clean thin film having the high quality is formed on the substrate 9.
|
