| 摘要 |
PURPOSE:To make a highly precise positioning possible even when a reflection preventing layer is used by a method wherein the deviation between the bubble pattern formed by a light and the positioning mark of a substrate is detected using the photosensitive layer which generates the gas that will remain in the form of bubble by the exposure to light. CONSTITUTION:A reaction preventing layer 3 is formed on the substrate 1 coated by the film having a high reflection factor. Then, the mixture of the layer 3 and a photosensitive layer is prevented, and the intermediate layer 4, which becomes the etching mask of the layer 3, is formed on the layer 3. Besides, a photosensitive layer 5 is formed on the layer 4. Subsequently, after a rough positioning has been performed, the positioning mark of a printing motor plate is projected on the layer 5 using an excimer laser beam, and a bubble pattern 6 is formed. Then, the deviation between the pattern 6 and the mark 2 of the substrate 1 is detected using the light having the wavelength different from that of the excimer laser beam, and a printing mother plate and the substrate 1 are positioned by reversely shifting the substrate 1 in the amount of deviation. As a result, a highly precise alignment can be performed even in the case where a reflection preventing layer is used for the exposure of high resolution. |
