| 摘要 |
What is described herein is an improved method of electroplating an adherent chromium deposit on a chromium substrate. The process is characterized by chemically oxidizing the chromium substrate before starting the electrodeposition of chromium thereon. A suitable chemical oxidizing agent is hydrogen ion, which can be furnished by a dilute acid solution. In this invention, the acid is characterized by being destroyed in the plating bath, if dragged therein. Suitable acids include oxalic and citric acids. The process is applicable to any chromium electroplating bath, including high energy efficient chromium baths, such as HEEF-40 baths, which are presently in commercial use.
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