发明名称 Integrated circuit modeling, design, and fabrication based on degradation mechanisms
摘要 An integrated circuit (IC) includes at least a first complementary MOS (CMOS) circuit, the first CMOS circuit comprising one or more first n-channel MOS (NMOS) transistors and one or more first p-channel MOS (PMOS) transistors, where the first NMOS transistors and the first PMOS transistors are arranged in the first CMOS circuit to drive at least a first common node of the first CMOS circuit. An average of the effective gate channel lengths of the first NMOS transistors (first NMOS average length) is at least 2% greater than an average of the effective gate channel lengths of the first PMOS transistors (first PMOS average length).
申请公布号 US7750400(B2) 申请公布日期 2010.07.06
申请号 US20080192850 申请日期 2008.08.15
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 SHANWARE AJIT;KRISHNAN SRIKANTH
分类号 H01L21/00 主分类号 H01L21/00
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