发明名称
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for an electrode of small contact resistance used for a 3-5 group compound semiconductor and to provide a 3-5 group compound semiconductor element containing the obtained electrode. SOLUTION: Relating to a method for manufacturing an electrode used for a 3-5 group compound semiconductor expressed by a formula Inx Gay Alz N(where, x+y+z=1, 0<=x<=1, 0<=y<=1, 0<=z<=1), a process wherein, after the surface of 3-5 group compound semiconductor is processed in the aqueous solution containing alkaline metal hydroxide and H2 O2 , an electrode is formed on the surface, is provided. A 3-5 group compound semiconductor element comprises an electrode manufactured by the above method.
申请公布号 JP3669091(B2) 申请公布日期 2005.07.06
申请号 JP19960346130 申请日期 1996.12.25
申请人 发明人
分类号 H01L21/28;H01L21/306;H01L33/32;H01L33/34;H01L33/40 主分类号 H01L21/28
代理机构 代理人
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