| 摘要 |
<p>PURPOSE:To enable quick inspection having high precision by providing an image detection means image-sensing a pattern on a mask, an image-sensing pattern data generating means and a compare check means comparing a design pattern data and an image-sensing pattern data and detecting the defect of the pattern of the mask. CONSTITUTION:A compare check unit 100 is fitted organically to a constituent for conducting lithography work, and a pattern data as an image-sensing data from a calibration unit 90 for the unit 100, a pattern data based on a design data (a source data) from a bit conversion unit 80, a scan timing signal from a scan control unit 62 and the positional data of tables 12, 16 are utilized and compared and the presence of the defects of the patterns is decided simultaneously. An electronic optical system 30 for an electron-beam lithography equipment can be utilized as it is in inspection work, thus removing an optical error. Accordingly, high resolving power can be displayed.</p> |
