| 摘要 |
PURPOSE:To detect material constructing a surface pattern, by neutralizing liquid metal or inert gas, irradiating this neutralized ion beam onto a surface of a body of a mask, etc. and allowing thus a substance to eject the material. CONSTITUTION:An ion-beam of 0.1mum diameter is formed by allowing an ion to radiate from ion gas 2 and the ion beam irradiated by molecular particles of gallium, boron, or argon onto a surface of a mask 8 with scanning using an ion-beam deflecting means 4 is installed crossing a flying path of the ion beam and neutralized using an ion-beam neutralizing means 5 consisting of grids, etc. applied with a negative voltage. When the neutralized ion beam is irradiated onto a chromium pattern and chromium is irradiated onto a glass surface, silicon is irradiated and these quantities are detected by a detecting means 7.
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