| 摘要 |
<p>PURPOSE:To improve the definition of a dyeable negative type photosensitive material and to obtain a color filter of high accuracy which can deal with the miniaturization and higher-scale integration of a pickup device by incorporating a UV ray absorbent which absorbs UV rays into a transparent layer right under a photosensitive film for forming a filter pattern. CONSTITUTION:The transparent underlying layer 3a contg. the UV ray absorbent 2 which is optically transparent to visible light and absorbs the UV rays, i.e., having an antireflection function to the UV rays is formed on the surface of a substrate 1. For example, a benzotriazole material or benzophenone material is utilizable the UV ray absorbent 2. The photosensitive film 4 for forming the filter pattern is formed on the UV ray absorbent-contg. transparent underlying layer 3a and is dried to solidify; thereafter, said film is subjected to UV ray exposure by using a mask, by which the patterning of the 1st filter layer is executed. The filter pattern 4b is then dyed by using a dye having a desired spectral characteristic. The 1st colored filter pattern 4b having the 1st color is thus formed.</p> |
