| 摘要 |
PURPOSE:To attain an excellent uniform development capacity and realize good reproducibility and easy handling by quickly moving a developing tank with an air cylinder and quickly immersing a photoresist disk in a developer to start development and tacking out the disk from the developer and pouring water onto the disk like a shower simultaneously to quickly stop development. CONSTITUTION:A glass disk 2 to which a photoresist film 1 to which a signal pattern is exposed is stuck is fixed onto a turntable 23 by vacuum. A shaft 5 starts to slowly rotate, and a photoresist disk 15 is completely immersed in a developer 16 to start development, and formation of a rugged pattern is started, and the diffracted light of the first order of an He-Ne laser light diffracted by this rugged pattern is made incident on a sensor 9. When a ratio of the output of the diffracted light sensor 9 to that of a light-transmissive sensor 8 reaches a certain value, discharge of the developer 16 is started, and a pure water 21 is poured onto the photoresist film 1 like a shower, and the photoresist disk 15 is put in pure water when the quantity of the pure water reaches a certain value. |
