| 摘要 |
PURPOSE:To provide an antistatic agent for synthetic polymeric material, composed of a specific phosphonium sulfonate compound, having excellent antistaticity and heat-resistance and capable of imparting a polymer with antistaticity having low sensitivity to moisture. CONSTITUTION:The objective antistatic agent is composed of a compound of formula I (A is 4-18C alkyl, alkenyl, etc.; R<1>-R<4> are 1-18C hydrocarbon group or substituted 1-18C hydrocarbon group; preferably R<1>, R<2> and R<3> are same 1-8C aliphatic or aromatic univalent hydrocarbon groups) derived from a phosphonium sulfonate anion (e.g. butylsulfonate, octylsulfonate, etc.) and an organic phosphonium cation (e.g. tetramethyl phosphonium). The agent is compounded to a polymeric material or applied to the surface of the material e.g. by spraying at an amount of 0.1-10wt%.
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