发明名称 ELECTRON BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To improve accuracy of lithography by installing an aperture, whose diameter is larger than that of a crossover, at an enlarged-image position of the crossover. CONSTITUTION:An image is formed in the center of deflection in a blanking deflector 18, with lenses 12 and 13 serving as zoom lenses in an electrongun crossover 11. The crossover image is formed on a main surface of an object lens 16 by lenses 14 and 15. An aperture image of a beam-formation aperture mask 22 is formed on a sample plane 17 by lenses 15 and 16. A diameter of the aperture 23a is set sufficiently larger than that L of the crossover image. Hence, even if noises such as ripples on a centering coil of the object lens 16 cause the cross-over image to vibrate, the beams are not interrupted by the aperture 23a, not generating fluctuation in intensity of the beams on the sample plane 17.
申请公布号 JPS62229937(A) 申请公布日期 1987.10.08
申请号 JP19860072949 申请日期 1986.03.31
申请人 TOSHIBA CORP 发明人 NAKASUJI MAMORU;WADA KANJI
分类号 H01J37/04;H01L21/027;H01L21/30 主分类号 H01J37/04
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