| 摘要 |
PURPOSE:To form a thin amorphous Co-Ge alloy film by electrodeposition with high productivity by adding a Co salt, a Gd salt and a nonaqueous solvent solubilizing the salts to a plating bath. CONSTITUTION:This Co-Gd alloy plating bath contains a Co salt, a Gd salt and a nonaqueous solvent solubilizing the salts. The kinds of the Co and Gd salts used are not especially limited but the preferred concn. of each of the salts is about 0.001-2mol/l and the preferred molar ratio between the Co and Gd salts is about 1:1-1:20. The kind of the nonaqueous solvent used is not necessarily limited but formamide is suitable for use as the solvent. In the Co-Gd alloy plating bath, Co and Gd can be electrodeposited as an alloy in an amorphous state, so a thin amorphous Co-Gd alloy film of a large area can be obtd. with high productivity without using a vacuum system.
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