| 摘要 |
PURPOSE:To improve a film thickness distribution on a substrate, to increase a film making speed, and to improve productivity, by impressing a DC magnetic flux between a target and the substrate in the vertical direction of a target plane, and forming a vertical magnetizing film containing Co and Cr as essential components on the substrate with a magnetron sputtering method. CONSTITUTION:In a magnetron sputtering device consisting of a target 1, an electrode 2, a magnet 3, an earth electrode 4, and a substrate 6, the DC magnetic flux is impressed between the plane of the target 1 and the substrate 6 through a DC magnetic flux impressing coil 5 in the vertical direction of the plane of the target 1. While the above state is being kept, the vertical magnetizing film containing Co and Cr as the essential component is formed on the substrate 6. In this way, uniformity in film thickness and the film making speed can be improved.
|
