| 摘要 |
<p>The process, for use in coating by vacuum deposition of metal, consists of (a) generating a plasma from one face of a sacrificial cathode of the material to be deposited, at one or more spots on the cathode, in an electric arc deposition chamber; and (b) creating a magnetic field close to the cathode face to extract the lines of force in a position inclined to the surface, and move the spot circularly over the plasma-emitting face.</p> |
